TITLE

Sputter depth profiling analysis of Ta[sub 2]O[sub 5] on Si without preferential sputtering by

AUTHOR(S)
Dae Won Moon; Kyung Joong Kim
PUB. DATE
June 1993
SOURCE
Applied Physics Letters;6/14/1993, Vol. 62 Issue 24, p3094
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Analyzes sputter depth profiling of Ta[sub 2]O[sub 5] on silicon without preferential sputtering by energetic oxygen ion beams. Relation between sputtering and chemical state; Incidence angle of oxygen ion from the normal surface; Factors influencing preferential sputtering.
ACCESSION #
4329737

 

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