Sputter depth profiling analysis of Ta[sub 2]O[sub 5] on Si without preferential sputtering by

Dae Won Moon; Kyung Joong Kim
June 1993
Applied Physics Letters;6/14/1993, Vol. 62 Issue 24, p3094
Academic Journal
Analyzes sputter depth profiling of Ta[sub 2]O[sub 5] on silicon without preferential sputtering by energetic oxygen ion beams. Relation between sputtering and chemical state; Incidence angle of oxygen ion from the normal surface; Factors influencing preferential sputtering.


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