TITLE

Silicon atomic layer growth controlled by flash heating in chemical vapor deposition using

AUTHOR(S)
Murota, Junichi; Sakuraba, Masao; Ono, Shoichi
PUB. DATE
May 1993
SOURCE
Applied Physics Letters;5/10/1993, Vol. 62 Issue 19, p2353
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the atomic-layer growth control of silicon on silicon substrate in chemical vapor deposition. Application of surface heat treatment via xenon flash lamp; Separation between surface adsorption and reaction of silicon tetrahydride gas on the substrate; Dependence of gas surface coverage on partial pressure and shot-to-shot time interval.
ACCESSION #
4329693

 

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