Direct measurement of size fluctuation in reverse-mesa etched quantum wire structures by the

Notomi, M.; Nakao, M.; Tamamura, T.
May 1993
Applied Physics Letters;5/10/1993, Vol. 62 Issue 19, p2350
Academic Journal
Performs direct measurement of size fluctuation in indium gallium arsenide/indium phosphide quantum wire structures. Use of atomic force microscopy; Use of electronic-beam lithography and reverse-mesa wet etching; Fluctuation in the lateral size of the wire pattern size; Formation of crystallographic facet during wet etching.


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