TITLE

Defect generation sensitivity depth profile in buried SiO[sub 2] using Ar plasma exposure

AUTHOR(S)
Stesmans, A.; Vanheusden, K.
PUB. DATE
May 1993
SOURCE
Applied Physics Letters;5/3/1993, Vol. 62 Issue 18, p2277
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the defect generation sensitivity depth profile in buried silica (BOX) using argon plasma exposure. Application of the electron spin resonance; Determination of local volume densities at the surface; Reoxidation of the BOX layers.
ACCESSION #
4329671

 

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