Local silicon molecular beam epitaxy with microshadow masks

Hammerl, E.; Eisele, I.
May 1993
Applied Physics Letters;5/3/1993, Vol. 62 Issue 18, p2221
Academic Journal
Presents a method for patterning of silicon layers grown by molecular beam epitaxy. Use of microshadow masks; Study of the geometrical shape of the deposited mesa pattern; Inclination of the mesa pattern.


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