Calibration of the multiple quantum well probe technique for dry-etch-induced damage analysis

Green, D.L.; Skidmore, J.A.; Lishan, D.G.; Hu, E.L.; Petroff, P.M.
March 1993
Applied Physics Letters;3/15/1993, Vol. 62 Issue 11, p1253
Academic Journal
Utilizes the multiple quantum well probe technique for dry-etch-induced damage analysis. Role of the dry etching process on the changes in the quantum well cathodoluminescence intensities; Establishment of the critical calibrations of the technique; Influence of the thickness of the quantum wells.


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