X-ray photoelectron spectroscopy and cross-sectional transmission electron microscopy studies

Ryu, S.R.; Shin, D.S.; Oh, J.E.; Choi, J.S.; Paek, S.H.; Lee, S.I.; Lee, J.K.; Sim, T.U.; Lee, J.G.; Sheng, G.T.
February 1993
Applied Physics Letters;2/8/1993, Vol. 62 Issue 6, p579
Academic Journal
Examines the oxygen diffusion and incorporation behaviors of TiN/Ti/Si structures after thermal annealing. Use of x-ray photoelectron spectroscopy and cross-sectional transmission electron microscopy; Formation of titanium dioxides; Factors influencing the blistering in the annealed sample.


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