TITLE

Low energy ion bombardment induced roughening and smoothing of SiO[sub 2] surfaces

AUTHOR(S)
Chason, E.; Mayer, T.M.
PUB. DATE
January 1993
SOURCE
Applied Physics Letters;1/25/1993, Vol. 62 Issue 4, p363
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the surface roughening and smoothing of silicon dioxide thin films by low energy ion bombardment. Determination of electron density gradient and film thickness; Formation of damaged layer at silicon dioxide/silicon interface; Dependence of surface smoothing on ion fluence.
ACCESSION #
4329484

 

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