Low energy ion bombardment induced roughening and smoothing of SiO[sub 2] surfaces

Chason, E.; Mayer, T.M.
January 1993
Applied Physics Letters;1/25/1993, Vol. 62 Issue 4, p363
Academic Journal
Investigates the surface roughening and smoothing of silicon dioxide thin films by low energy ion bombardment. Determination of electron density gradient and film thickness; Formation of damaged layer at silicon dioxide/silicon interface; Dependence of surface smoothing on ion fluence.


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