Negative differential resistance of metal (CoSi[sub 2])/insulator (CaF[sub 2]) triple-barrier

Watanabe, Masahiro; Suemasu, Takashi; Muratake, Shigeki; Asada, Masahiro
January 1993
Applied Physics Letters;1/18/1993, Vol. 62 Issue 3, p300
Academic Journal
Analyzes the electron transport and negative differential resistance in metal-insulator nanometer-thick heterostructures. Growth of layers by partially ionized beam epitaxy; Components of the heterostructures; Distribution of the resistance bias voltage range.


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