TITLE

Nitrogen incorporation in SiO[sub 2] by rapid thermal processing of silicon and SiO[sub 2] in

AUTHOR(S)
Weidner, G.; Kruger, D.
PUB. DATE
January 1993
SOURCE
Applied Physics Letters;1/18/1993, Vol. 62 Issue 3, p294
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the nitrogen incorporation in silicon dioxide (SiO[sub 2]) by rapid thermal processing of Si and SiO[sub 2] in N[sub 2]O. Degradation of thin silicon oxide by charge carrier transport; Dependence of nitrogen incorporation on silicon and silicon oxide; Formation of a nitrogen containing interlayer.
ACCESSION #
4329460

 

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