Metalorganic chemical vapor deposition of TiN films for advanced metallization

Sandhu, Gurtej S.; Meikle, Scott G.; Doan, Trung T.
January 1993
Applied Physics Letters;1/18/1993, Vol. 62 Issue 3, p240
Academic Journal
Examines the advanced metallization in the chemical vapor deposition of titanium nitride films. Properties of thin TiN film deposits; Characterization of deposited films by resistivity, stoichiometry and etch rates; Susceptibility to ex situ contamination with low density.


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