TITLE

Metalorganic chemical vapor deposition of TiN films for advanced metallization

AUTHOR(S)
Sandhu, Gurtej S.; Meikle, Scott G.; Doan, Trung T.
PUB. DATE
January 1993
SOURCE
Applied Physics Letters;1/18/1993, Vol. 62 Issue 3, p240
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the advanced metallization in the chemical vapor deposition of titanium nitride films. Properties of thin TiN film deposits; Characterization of deposited films by resistivity, stoichiometry and etch rates; Susceptibility to ex situ contamination with low density.
ACCESSION #
4329441

 

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