Fused silica masks for printing uniform and phase adjusted gratings for distributed feedback lasers

Pakulski, G.; Moore, R.; Maritan, C.; Shepherd, F.; Fallahi, M.; Templeton, I.; Champion, G.
January 1993
Applied Physics Letters;1/18/1993, Vol. 62 Issue 3, p222
Academic Journal
Utilizes the fused silica masks on the distributed feedback oscillators. Fabrication of the masks through holographic and fused ion beam lithography; Determination of the durability of the photomask; Components of the masks.


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