Free-running XeF(C-A) lasing at 2.2 atm in a commercial discharge excimer laser

Yong-Kang Cheng; Shao-Peng Yang; Min-Xiao Wang; Zu-Guang Ma
January 1993
Applied Physics Letters;1/4/1993, Vol. 62 Issue 1, p4
Academic Journal
Demonstrates efficient free running lasing on the XeF(C-A) electronic transition in an unmodified commercial discharge excimer laser. Reduction of buffer gas pressure; Measurement of the laser spectrum peak wavelength and bandwidth; Computation of the laser output energy.


Related Articles

  • High-power XeCl discharge laser with a large active volume. Hasama, Toshifumi; Miyazaki, Kenzo; Yamada, Kawakatsu; Ohuchi, Kazumi; Sato, Takuzo // Journal of Applied Physics;5/1/1987, Vol. 61 Issue 9, p4691 

    Evaluates an X-ray preionized discharge-pumped XeCl laser with a laser-electrode separation. Largest laser energy achieved with a discharge excimer laser; Information on the research on discharge excimer lasers; Description of excimer lasers.

  • Highly efficient excimer-based white phosphorescent devices with improved power efficiency and color rendering index. Xiaohui Yang; Zixing Wang; Madakuni, Sijesh; Jian Li; Jabbour, Ghassan E. // Applied Physics Letters;11/10/2008, Vol. 93 Issue 19, p193305 

    Power efficiency, Commission Internationale d’Énclairage (CIE) coordinates, and color rendering index (CRI) of white phosphorescent excimer devices were improved by utilizing two platinum complexes as emissive dopants and exploring different device structures. Compared with devices...

  • Measurement of solid-liquid interface temperature during pulsed excimer laser melting of.... Xianfan Xu; Grigoropoulos, Costas P. // Applied Physics Letters;10/3/1994, Vol. 65 Issue 14, p1745 

    Presents a nanosecond time resolution pyrometer for measuring transient temperature of thin polycrystalline silicon films irradiated by pulsed excimer laser. Agreement of melting duration measurement with the thermal emission measurement; Calculation of the maximum melt front velocities at...

  • Noncontact nanosecond-time-resolution temperature measurement in excimer laser heating Ni-P.... Shaochen Chen; Grigoropoulos, Costas P. // Applied Physics Letters;12/1/1997, Vol. 71 Issue 22, p3191 

    Measures the thermal emission from a Ni-P disk substrate heated by a pulse excimer laser with nanosecond time resolution. Employment of a fast InGaAs to capture the thermal emission signal; In situ measurement of the spectral surface reflectivity; Derivation of the transient surface temperature.

  • Temperature measurement in fuel-rich non-sooting low-pressure hydrocarbon flames. Hartlieb, A.T.; Atakan, B.; Kohse-Höinghaus, K. // Applied Physics B: Lasers & Optics;2000, Vol. 70 Issue 3, p435 

    Abstract. Several temperature measurement techniques were compared for the investigation of fuel-rich, premixed, flat, low-pressure flames of propene, acetylene, and cyclopentene with maximum temperatures around 2400 K. Vibrational Stokes/anti-Stokes Raman measurements with a KrF excimer laser...

  • A Novel Laser Energy Meter Based on Laser-induced Voltage. LIU, X.; ZHANG, H.; CHU, Q. M.; ZHANG, S-C.; CHEN, Q-M.; CAO, M-G; LAN, J.; ZHANG, P-X. // Lasers in Engineering (Old City Publishing);2013, Vol. 24 Issue 3/4, p269 

    A novel laser energy meter based on laser induced voltage was fabricated. Within the range from infrared to ultraviolet light (with wavelengths of 193 nm, 248 nm and 1.06 um (micrometre)) the optical response to the pulses of ArF excimer lasers, KrF excimer laser and Nd:YAG lasers were measured....

  • Excimer ArF laser with an output energy of 1.3 J at 2.0% efficiency on the He:Ar:F2 mixture. Razhev, A.M.; Zhupikov, A.A. // Applied Physics B: Lasers & Optics;Dec2005, Vol. 81 Issue 8, p1113 

    In this paper it is shown that to achieve a maximum efficiency and high output energy of an ArF (193 nm) excimer laser, one should use optimal pump intensity. It has been shown experimentally that the optimal pump intensity for an ArF excimer laser with the mixture of He:Ar:F2 has a value of...

  • Excimer laser machining of microvias in glass substrates for the manufacture of high density interconnects. Bhatt, D.; Hutt, D.; Conway, P. // Applied Physics B: Lasers & Optics;Jul2012, Vol. 108 Issue 1, p137 

    Machining of microvias in 100-50 μm thick CMZ glass using an excimer laser (248 nm) was investigated. The effect of various laser process parameters: pulse energy, repetition rate, irradiation time were studied to optimise the microvia drilling process and a process window was identified....

  • Asymmetry in electron and ion charge collection in a drifting plasma bunch. Belloni, F.; Lorusso, A.; Nassisi, V. // Journal of Applied Physics;5/1/2007, Vol. 101 Issue 9, p096102 

    We report on the different behavior of electron and ion currents recorded by a Faraday cup in a plasma bunch generated via laser ablation. An excimer laser was employed to irradiate a Ge target. The current signals were recorded equipping the Faraday cup collector by a set of diaphragms. We...


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics