TITLE

Highly accurate etching of ridge-waveguide directional couplers using in situ reflectance

AUTHOR(S)
Vawter, G.A.; Klem, J.F.; Hadley, G.R.; Kravitz, S.H.
PUB. DATE
January 1993
SOURCE
Applied Physics Letters;1/4/1993, Vol. 62 Issue 1, p1
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the etching of ridge-waveguide directional couplers. Use of in situ reflectance monitoring; Achievement of accurate etch rate and etch depth; Computation of added loss due to coupling length error; Importance of waveguides in photonic integrated circuits.
ACCESSION #
4329393

 

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