In situ investigation of amorphous silicon/silicon nitride interfaces by infrared ellipsometry

Shirai, H.; Drevillon, B.; Ossikovski, R.
May 1993
Applied Physics Letters;5/31/1993, Vol. 62 Issue 22, p2833
Academic Journal
Evaluates plasma-deposited amorphous silicon and silicon nitride interfaces via infrared ellipsometry. Role of deposition sequence in the experiment; Relationship of deposition sequence and the underlayer material; Discussion on the formation mechanism of the interfaces.


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