Photoluminescence study of anodized porous Si after HF vapor phase etching

Shih, S.; Jung, K.H.; Kwong, D.L.; Kovar, M.; White, J.M.
April 1993
Applied Physics Letters;4/19/1993, Vol. 62 Issue 16, p1904
Academic Journal
Investigates the mechanism of photoluminescence (PL) shift by hydrofluoric vapor phase etching in oxygen ambient. Efficiency of vapor phase etching; Role of surface passivation on the PL shift; Use of the Fourier-transform infrared spectroscopy.


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