TITLE

Size effects in the epitaxial realignment of polycrystalline silicon films onto Si substrates

AUTHOR(S)
Benyaich, F.; Rimini, E.; Spinella, C.; Cacciato, A.; Fallico, G.; Ferla, G.; Ward, P.
PUB. DATE
April 1993
SOURCE
Applied Physics Letters;4/19/1993, Vol. 62 Issue 16, p1895
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the epitaxial realignment of polycrystalline silicon (Si) films on the crystalline Si substrates. Variation in the contact area dimensions; Use of rectangular width and length strips; Growth kinetics in the small width geometry.
ACCESSION #
4323133

 

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