Size effects in the epitaxial realignment of polycrystalline silicon films onto Si substrates

Benyaich, F.; Rimini, E.; Spinella, C.; Cacciato, A.; Fallico, G.; Ferla, G.; Ward, P.
April 1993
Applied Physics Letters;4/19/1993, Vol. 62 Issue 16, p1895
Academic Journal
Investigates the epitaxial realignment of polycrystalline silicon (Si) films on the crystalline Si substrates. Variation in the contact area dimensions; Use of rectangular width and length strips; Growth kinetics in the small width geometry.


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