Enhancement and stabilization of porous silicon photoluminescence by oxygen incorporation with a

Xiao, Y.; Heben, M.J.; McCullough, J.M.; Tsuo, Y.S.; Pankove, J.I.; Deb, S.K.
March 1993
Applied Physics Letters;3/8/1993, Vol. 62 Issue 10, p1152
Academic Journal
Examines the enhancement of porous silicon photoluminescence by oxygen incorporation with remote-plasma treatment. Reduction of silicon dihydride concentration by vacuum anneal treatment; Effect of plasma exposure on film hydrogen content; Distinction between atomic hydrogen and oxygen densities.


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