Submicron niobium junctions for submillimeter-wave mixers using optical lithography

Dierichs, M.M.T.M.; Panhuyzen, R.A.; Honingh, C.E.; de Boer, M.J.; Klapwijk, T.M.
February 1993
Applied Physics Letters;2/15/1993, Vol. 62 Issue 7, p774
Academic Journal
Presents a method for fabricating submicron-sized superconductor-insulator-superconductor niobium junction using optical lithography. Selective niobium etching process; Suitability of the junction for submillimeter-wave mixer; Independence of the junction quality on the amount of etching.


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