TITLE

Reflection high energy electron diffraction intensity oscillations during the growth by

AUTHOR(S)
Neave, J.H.; Zhang, J.; Zhang, X.M.; Fawcett, P.N.; Joyce, B.A.
PUB. DATE
February 1993
SOURCE
Applied Physics Letters;2/15/1993, Vol. 62 Issue 7, p753
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the reflection high energy electron diffraction intensity oscillation during the eptaxial growth of gallium arsenide(110) film. Use of molecular beam epitaxial technique; Dependence of the oscillation period on growth temperature, flux ratio and duration; Interpretation of the results in terms of growth modes and relative adatom populations.
ACCESSION #
4322971

 

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