Hydrogen plasma removal of AlGaAs oxides before molecular beam epitaxy

Choquette, Kent D.; Hong, M.; Chu, S.N.G.; Luftman, H.S.; Mannaerts, J.P.; Wetzel, R.C.; Freund, R.S.
February 1993
Applied Physics Letters;2/15/1993, Vol. 62 Issue 7, p735
Academic Journal
Describes a method for the removal of AlGaAs native oxides prior to molecular beam epitaxial overgrowth. Removal of the oxides in an electron cyclotron resonance hydrogen plasma; Application of reflection high-energy electron diffraction; Detection of interfacial impurities by secondary ion mass spectrometry.


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