Catalytic effect of phosphine on the deposition of phosphosilicate glass from tetraethoxysilane

Tedder, Laura L.; Crowell, John E.; Uram, Kevin J.; Shugrue, John K.; Tribula, D.
February 1993
Applied Physics Letters;2/15/1993, Vol. 62 Issue 7, p699
Academic Journal
Analyzes the effect of phosphorus incorporation on the deposition rate of phosphosilicate glass from tetraethoxysilane. Utilization of hot-walled low-pressure chemical vapor deposition reactor; Rate of doped silicate glass; Enhancement in deposition rate of SiO[sub 2].


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