TITLE

Stability of ultrathin silicon nitride films on Si(100)

AUTHOR(S)
Huang, L.J.; Kwok, R.W.M.; Lau, W.M.; Tang, H.T.; Lennard, W.N.; Mitchell, I.V.; Schultz, P.J.
PUB. DATE
January 1993
SOURCE
Applied Physics Letters;1/11/1993, Vol. 62 Issue 2, p163
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the stability of ultrathin silicon nitride films on silicon(100). Techniques used to study the material characteristics; Preparation of the films by remote microwave plasma chemical vapor deposition; Effect of vacuum annealing on the thin films.
ACCESSION #
4322925

 

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