TITLE

Formation of a thin SiO[sub 2] film using synchrotron radiation excited reaction

AUTHOR(S)
Ogawa, Taro; Ochiai, Isao; Mochiji, Kozo; Hiraiwa, Atsushi
PUB. DATE
August 1991
SOURCE
Applied Physics Letters;8/12/1991, Vol. 59 Issue 7, p794
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the possibility of altering an oxygen-adsorbed silicon surface to silicon oxide. Use of synchrotron radiation excited reaction; Adsorption of oxygen gas and irradiation of soft x-ray by synchrotron radiation; Elimination of partly terminated hydrogen; Detection of photostimulated desorption of hydrogen ions.
ACCESSION #
4322481

 

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