Cs[sup +] reactive scattering from a Si(111) surface adsorbed with water

Yang, M.C.; Hwang, C.H.; Kang, H.
August 1997
Journal of Chemical Physics;8/15/1997, Vol. 107 Issue 7, p2611
Academic Journal
Studies the reactive scattering of hyperthermal Cs ion from a Si(111) surface adsorbed with water. Collisions of Cs[sup +] beams with the silicon surface; Examination of the yields for the clusters as a function of Cs[sup +] beam energy and water exposure.


Related Articles

  • A theoretical study of collision induced desorption spectroscopy from Si(111) surfaces. Zeiri, Yehuda; Low, John J.; Goddard, William A. // Journal of Chemical Physics;2/15/1986, Vol. 84 Issue 4, p2408 

    A theoretical classical stochastic trajectory study of collision induced desorption spectroscopy (CIDS) is presented in this paper. These theoretical results suggest that CIDS might provide useful experimental information on the binding energy and binding sites for adsorbates on surfaces. This...

  • Helium atom scattering and HREELS investigations of the H/Rh(311) adsorption system. Farias, Daniel; Siebentritt, Susanne // Journal of Chemical Physics;5/15/1997, Vol. 106 Issue 19, p8254 

    Discusses the helium atom scattering and HREELS investigations of the H/Rh(311) adsorption system. Quantitative analysis of the helium atom scattering data; HREELS results; Work function measurements.

  • Adsorption of fluid vesicles. Baumgartner, A.; Bhattacharjee, Somendra M. // Journal of Chemical Physics;9/15/1997, Vol. 107 Issue 11, p4390 

    Studies the adsorption of fluid vesicles in a planar surface using Monte Carlo simulation methods and scaling arguments for the random surface model. Consideration of deflated as well as inflated vesicles; Increase of adhesion strength of inflated vesicles; Exhibition of a continuous transition...

  • Adsorption on surfaces with molecular-scale heterogeneities. Aranovich, G. L.; Donohue, M. D. // Journal of Chemical Physics;3/8/1996, Vol. 104 Issue 10, p3851 

    The Ono–Kondo lattice model for the density gradient near a surface is applied to surfaces where the adsorbate–adsorbent interactions are not homogeneous. While solving the general equations would be quite complex, relatively simple solutions can be obtained for periodic surfaces...

  • The IMEC clean: A new concept for particle and metal removal on Si surfaces. Meuris, M.; Mertens, Pp.W. // Solid State Technology;Jul95, Vol. 38 Issue 7, p109 

    Describes the IMEC clean concept for particle and metal removal on silicon surfaces for use in the microelectronic industry. Removal of oxidation and oxide; Particle and metal removal efficiencies; Minimizing surface roughening; Electrical breakdown measurements.

  • Self-organization during Si1-yCy alloy layer growth on Si(001) using homogeneous coevaporation. Osten, H.J.; Bugiel, E. // Journal of Applied Physics;7/1/1997, Vol. 82 Issue 1, p231 

    Shows that the formation of self-organized psuedosuperlattices during homogeneous epitaxial growth of Si1-yCy on Si(001) is a fundamental phenomenon not limited to special growth techniques. Periodicity as a monotonic function of the growth conditions; Different amount of carbons contained in...

  • Stabilization of the photoluminescence from porous silicon: The competition between... Dudel, Frank P.; Gole, James L. // Journal of Applied Physics;7/1/1997, Vol. 82 Issue 1, p402 

    Demonstrates the means to stabilize the photoluminescence from an electrochemically etched (100) silicon surface. Stabilizing influence of water on a nonaqueous etching process; Stabilizing effect of hydrochloric acid on porous silicon surface.

  • Real-time monitoring of the Si carbonization process by a combined method of reflection...  // Applied Physics Letters;6/28/1999, Vol. 74 Issue 26, p3939 

    Investigates the carbonization process of a preferential-domain Si(001)2x1 surface with ethylene. Use of a combined method of reflection high-energy electron diffraction and Auger electron spectroscopy.

  • Effect of hydrogen termination on the work of adhesion between rough polycrystalline silicon... Houston, Michael R.; Howe, Roger T. // Journal of Applied Physics;4/15/1997, Vol. 81 Issue 8, p3474 

    Measures the work of adhesion between polycrystalline silicon surfaces with the use of a novel micromachined test structure. Cantilever beam array technique; Microstructure fabrication and release; Surface treatments; Measurement of the work of adhesion; Chemical composition of treated surfaces;...


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics