TITLE

Dynamic pulsed plasma reactor for chemical vapor deposition of advanced materials

AUTHOR(S)
Sanner, Mark A.; Park, Jin Y.
PUB. DATE
March 1997
SOURCE
Review of Scientific Instruments;Mar97, Vol. 68 Issue 3, p1575
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Describes a dynamic pulsed plasma reactor (DPPR) capable of technical vapor deposition of advanced materials on substrates located in a supersonic expansion nozzle. Combination of plasma, shock tube and supersonic expansion nozzle techniques; Vapor quenching rates obtained from reactants; Theoretical gas dynamics describing wave motion and propagation of reactants in DPPR.
ACCESSION #
4320545

 

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