TITLE

New photothermal deflection method for thermal diffusivity measurement of semiconductor wafers

AUTHOR(S)
Bertolotti, M.; Dorogan, V.; Liakhou, G.; Li Voti, R.; Paoloni, S.
PUB. DATE
March 1997
SOURCE
Review of Scientific Instruments;Mar97, Vol. 68 Issue 3, p1521
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Discusses the application of the photothermal deflection technique in transverse configuration to measure the thermal diffusivity of semiconductor wafers. Inhibition of the possibility to make the probe beam skim the sample at a small height; Proposed experimental schemes based on a different geometry of the heat diffusion; Obtained low probe beam height.
ACCESSION #
4320535

 

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