TITLE

Preparation of ultrathin microscrystalline silicon layers by atomic hydrogen etching of

AUTHOR(S)
Nguyen, H.V.; An, Ilsin; Collins, R.W.; Yiwei Lu; Wakagi, M.; Wronski, C.R.
PUB. DATE
December 1994
SOURCE
Applied Physics Letters;12/26/1994, Vol. 65 Issue 26, p3335
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates etching of hydrogenated amorphous silicon (a-Si:H) in atomic hydrogen. Use of real time ellipsometry for a-Si:H films; Density of microcrystalline Si films in substrate material; Effects of surface a-Si:H crystallization on Si films.
ACCESSION #
4319492

 

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