Surface roughness during chemical beam etching and its remedy by enhanced cation diffusion

Chiu, T.H.; Williams, M.D.
July 1994
Applied Physics Letters;7/25/1994, Vol. 65 Issue 4, p448
Academic Journal
Examines the surface roughness during chemical etching and the remedy through electrodiffusion of cations. Tolerance of instant switching between the etch and the growth modes; Identification of a roughening mechanism; Achievement of mirror-like morphology.


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