TITLE

Deposition of in situ boron-doped polycrystalline silicon films at reduced pressures

AUTHOR(S)
Horng-Chih Lin; Hsiao-Yi Lin; Chun-Yen Chang; Tan-Fu Lei; Wang, P.J.; Ray-Chern Deng; Jandel Lin
PUB. DATE
February 1994
SOURCE
Applied Physics Letters;2/7/1994, Vol. 64 Issue 6, p763
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the deposition of boron (B)-doped polycrystalline silicon films on silica surface. Link between deposition rate and doping level; Use of chemical vapor deposition; Absorption of B atoms on silica surface.
ACCESSION #
4319415

 

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