TITLE

Uniform and large-area deposition of diamond by cyclic thermal plasma chemical vapor deposition

AUTHOR(S)
Eguchi, Keisuke; Yata, Shigeo; Yoshida, Toyonobu
PUB. DATE
January 1994
SOURCE
Applied Physics Letters;1/3/1994, Vol. 64 Issue 1, p58
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the deposition of diamond films on the substrates placed on a rotating stage using cyclic thermal plasma chemical vapor deposition. Generation of the Ar-H[sub 2]-CH[sub 4] plasma jet; Use of hybrid plasma torch for the deposition of ceramic coatings; Illustration of the rotating graphite stage.
ACCESSION #
4319355

 

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