Open air deposition of SiO[sub 2] film from a cold plasma torch of

Inomata, Kiyoto; Hyunkwon Ha; Chaudhary, Khaliq A.; Koinuma, Hideomi
January 1994
Applied Physics Letters;1/3/1994, Vol. 64 Issue 1, p46
Academic Journal
Examines the application of an atmospheric pressure cold plasma torch to the deposition of silicon dioxide thin films. Decomposition of tetramethoxylsilane; Generation of the radio frequency plasma beam; Impact of plasma hydrogen admixing on the film structure and properties.


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