Electron Penning trap for the generation of high density non-neutral plasmas

Schauer, M.M.; Mithcell, T.B.; Holzscheiter, M.H.; Barnes, D.C.
September 1997
Review of Scientific Instruments;Sep97, Vol. 68 Issue 9, p3340
Academic Journal
Describes an experiment to produce high density pure electron plasmas in a cryogenic Penning trap. Description of the apparatus and its operation; Summary of data acquired to date, and its interpretation; Possible uses and future work.


Related Articles

  • ECR-Driven Multicusp Volume H- Ion Source. Bacal, M.; Ivanov Jr., A. A.; Rouillé, C.; Svarnas, P.; Béchu, S.; Pelletier, J. // AIP Conference Proceedings;2005, Vol. 763 Issue 1, p203 

    We studied the negative ion current extracted from the plasma created by seven elementary ECR sources, operating at 2.45 GHz, placed in the magnetic multipole chamber “Camembert III”. We varied the pressure from 1 to 4 mTorr, with a maximum power of 1 kW and studied the plasma...

  • Application of cryotarget to laser ion source. Tamura, Jun; Okamura, Masahiro; Kanesue, Takeshi // Review of Scientific Instruments;Feb2008, Vol. 79 Issue 2, p02B101 

    We examined laser-produced argon plasma as part of a future laser ion source. Rare gases, which are in gas state at room temperature, need to be cooled to solid targets for laser irradiation. We generated solid Ar targets in a similar way used for neon. By irradiating the solid Ar with a...

  • Fourth generation electron cyclotron resonance ion sources (invited). Lyneis, Claude M.; Leitner, D.; Todd, D. S.; Sabbi, G.; Prestemon, S.; Caspi, S.; Ferracin, P. // Review of Scientific Instruments;Feb2008, Vol. 79 Issue 2, p02A321 

    The concepts and technical challenges related to developing a fourth generation electron cyclotron resonance (ECR) ion source with a rf frequency greater than 40 GHz and magnetic confinement fields greater than twice BECR will be explored in this article. Based on the semiempirical frequency...

  • Enhancement in ion beam current with layered-glows in a constricted dc plasma ion source. Park, Yeong-Shin; Hwang, Y. S. // Review of Scientific Instruments;Feb2010, Vol. 81 Issue 2, p02B309 

    High current mode has been discovered and investigated in a constricted dc plasma ion source. As discharge currents exceed a certain threshold, voltage to sustain the constricted dc plasma suddenly falls down to almost half of the value. In this sense, constricted dc plasmas can be sustained at...

  • The 25 mA continuous-wave surface-plasma source of H- ions. Belchenko, Yu.; Gorbovsky, A.; Sanin, A.; Savkin, V. // Review of Scientific Instruments;2014, Vol. 85 Issue 2, p1 

    The ion source with the Penning geometry of electrodes producing continuous-wave beam of H- ions with current up to 25 mA was developed. Several improvements were introduced to increase source intensity, reliability, and lifetime. The collar around the emission aperture increases the electrons...

  • Analysis of plasma distribution near the extraction region in surface produced negative ion sources. Fukano, A.; Hatayama, A. // Review of Scientific Instruments;2014, Vol. 85 Issue 2, p1 

    In study of a negative ion source, it is important to understand the plasma characteristics near the extraction region. A recent experiment in the NIFS-R&D ion source has suggested that a "double ion plasma layer" which is a region consisting of hydrogen positive and negative ions exists near...

  • Characteristics of multiantenna rf ion source. Oka, Y.; Shoji, T.; Hamabe, M.; Sakawa, Y.; Suzuki, T.; Ikeda, K.; Kaneko, O.; Nagaoka, K.; Osakabe, M.; Takeiri, Y.; Tsumori, K.; Asano, E.; Kawamoto, T.; Kondo, T.; Sato, M. // Review of Scientific Instruments;May2004, Vol. 75 Issue 5, p1841 

    A multiantenna rf ion source is studied. The new antenna system is developed to reduce the rf voltage on the antenna compared to that of the conventional loop antenna, which can reduce high voltage rf breakdown on antennas. The antenna was installed in a 1/6 scale ion source for the neutral beam...

  • Simultaneous projection and detection system of four different frequencies for microwave imaging reflectometry in Large Helical Device. Yoshinaga, T.; Nagayama, Y.; Kuwahara, D.; Tsuchiya, H.; Yamaguchi, S.; Kogi, Y.; Tsuji-Iio, S.; Mase, A. // Review of Scientific Instruments;Oct2010, Vol. 81 Issue 10, p10D915 

    A simultaneous projection/detection system of four different frequencies for microwave imaging reflectometry (MIR) was developed for three-dimensional observation of electron density fluctuations in the Large Helical Device (LHD). The microwave with four frequency components at 60.410, 61.808,...

  • Characteristics of plasma grid bias in large-scaled negative ion source. Kisaki, M.; Tsumori, K.; Ikeda, K.; Nakano, H.; Osakabe, M.; Nagaoka, K.; Takeiri, Y.; Kanekob, O. // Review of Scientific Instruments;2014, Vol. 85 Issue 2, p1 

    The electron density was measured at various bias voltages to understand how the plasma grid bias affects the electron near the plasma grid in large-scaled negative ion sources. It was found that the response of the electron to the bias voltage changes depending on negative ion production...


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics