TITLE

Inductively coupled radio frequency plasma chemical vapor deposition using a ladder-shaped antenna

AUTHOR(S)
Murata, Masayoshi; Takeuchi, Yosiaki; Sasagawa, Eishiro; Hamamoto, Kazutoshi
PUB. DATE
April 1996
SOURCE
Review of Scientific Instruments;Apr96, Vol. 67 Issue 4, p1542
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Reports on the production of an inductively coupled radio frequency plasma via chemical vapor deposition using a ladder-shaped antenna. Negative self-bias potential on the electrode; Observation that the phase of the potential precedes the current fed to the electrode.
ACCESSION #
4302045

 

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