TITLE

A metal plasma source ion implantation and deposition system

AUTHOR(S)
Bin Liu; Li, B.; Sun, M.; Jiang, B.Y.; Ren, Y.F.; Si-Ze Yang
PUB. DATE
March 1999
SOURCE
Review of Scientific Instruments;Mar99, Vol. 70 Issue 3, p1816
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Presents a metal plasma source ion implantation and deposition system, which is a qualitative extension of plasma source ion implantation. Combination of pulsed metal plasma and steady-state gas plasma; Pulsed cathodic arc discharge that produces pulsed metal plasma; Production of steady-state gas plasma by magnetic multipole filament discharge.
ACCESSION #
4295815

 

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