TITLE

New doser for chemical vapor deposition of low vapor-pressure solid precursors

AUTHOR(S)
Serghini-Monim, S.; Coatsworth, L.L.; Norton, P.R.; Puddephatt, R.J.
PUB. DATE
October 1996
SOURCE
Review of Scientific Instruments;Oct96, Vol. 67 Issue 10, p3672
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Describes an ultrahigh vacuum compatible device to maximize the volatilization of low vapor-pressure precursors used in chemical vapor deposition processes while minimizing their dissociation. Doser design description and performance; Use of the doser for multicomponent film deposition and for the injection of organometallic complexes into a plasma.
ACCESSION #
4295519

 

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