TITLE

Porous silicon fabrication technique for large area devices

AUTHOR(S)
Grigoras, K.; Pacebutas, V.
PUB. DATE
June 1996
SOURCE
Review of Scientific Instruments;Jun96, Vol. 67 Issue 6, p2337
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Proposes an improved technique applied for fabrication of porous silicon layers on silicon wafers. Main principle in the technique; Etching of large silicon wafers in the electrochemical cell; Deposit of porous silicon coating on as-prepared solar cells.
ACCESSION #
4295446

 

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