TITLE

In situ investigation of silicon surface cleaning and damage by argon electron cyclotron

AUTHOR(S)
Hu, Y.Z.; Buaud, P.P.; Wang, Y.; Spanos, L.; Irene, E.A.
PUB. DATE
March 1994
SOURCE
Applied Physics Letters;3/7/1994, Vol. 64 Issue 10, p1233
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the removal of oxide films from a silicon (Si) surface by argon electron cyclotron resonance plasmas. Significance of the low ion energy and high ion fluxes; Use of spectroscopic ellipsometry and atomic force microscopy; Factors attributing to the Si surface damage.
ACCESSION #
4294246

 

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