On plastic flow and work hardening in strained layer heterostructures

Fischer, A.; Richter, H.
March 1994
Applied Physics Letters;3/7/1994, Vol. 64 Issue 10, p1218
Academic Journal
Presents an alternate model for metastable strain relaxation in heteroepitaxial semiconductor structures. Concept of the misfit dislocation self-stress lying in the interface of two orthogonal arrays; Analysis of the plastic flow and work hardening model in layer heterostructures; Interface dislocation spacing in a highly dislocated material.


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