Application of x-ray interference method for residual strain measurement in low energy Ar

Cho-Jen Tsai; Vreeland Jr., Thad; Atwater, Harry A.
January 1994
Applied Physics Letters;1/24/1994, Vol. 64 Issue 4, p434
Academic Journal
Demonstrates the employment of x-ray interference technique to quantify the average residual strain generated by low energy ion bombardment. Determination of average residual strain in thin bombarded layers; Increase of the interference peak; Formation of defects by low energy ion bombardment at moderate temperature.


Related Articles

  • Residual stresses in amorphous alumina films synthesized by ion beam assisted deposition. Parfitt, L.; Goldiner, M.; Jones, J. W.; Was, G. S. // Journal of Applied Physics;4/1/1995, Vol. 77 Issue 7, p3029 

    Focuses on a study which determined the origin of residual stresses in amorphous Al[sub2]O[sub3] films formed by ion beam assisted deposition. Background on models about the origin of residual stress; Experimental procedure; Results; Discussion.

  • Residual stress in nano-structured stainless steel (AISI 316L) prompted by Xe+ ion bombardment at different impinging angles. Cucatti, S.; Droppa Jr, R.; Figueroa, C. A.; Klaus, M.; Genzel, Ch.; Alvarez, F. // Journal of Applied Physics;2016, Vol. 120 Issue 14, p1 

    The effect of low energy (<1 keV) xenon (Xe+) ion bombardment on the residual stress of polycrystalline iron alloy (AISI 316L steel) is reported. The results take into account the influence of the ion incident angle maintaining constant all other bombarding parameters (i.e., ion energy and...

  • A New Methodology For In-Situ Residual Stress Measurement In MEMS Structures. Sebastiani, M.; Bemporad, E.; Melone, G.; Rizzi, L.; Korsunsky, A. M. // AIP Conference Proceedings;11/27/2010, Vol. 1300 Issue 1, p120 

    In this paper, a new approach is presented for local residual stress measurement in MEMS structures. The newly proposed approach involves incremental focused ion beam (FIB) milling of annular trenches at material surface, combined with high resolution SEM imaging and Digital Image Correlation...

  • Measurement of residual stresses in micromachined structures in a microregion. Sabaté, N.; Vogel, D.; Gollhardt, A.; Keller, J.; Michel, B.; Cané, C.; Gràcia, I.; Morante, J. R. // Applied Physics Letters;2/13/2006, Vol. 88 Issue 7, p071910 

    The use of a focused ion beam equipment is reported to find out the in-plane residual stress value of a microelectromechanical system structure by performing a local stress release. The ion beam column is used to mill stress-release slots of a few microns, whereas the scanning electron column...

  • Si and SiO2 layer transfer induced by mechanical residual stress. Loryuenyong, V.; Cheung, N. W. // Applied Physics Letters;3/27/2006, Vol. 88 Issue 13, p132103 

    Using the polymer SU-8 as a bonding and stress-inducing layer, we have demonstrated that Si and SiO2 layers can be transferred by mechanical cleavage to SU-8/glass substrates without ion implantation of the donor wafers. Cracks tend to propagate under mode II criterion (KII=0) at a...

  • A 200 nm thick glass-forming metallic film for fatigue-property enhancements. Chiang, C. L.; Chu, J. P.; Liu, F. X.; Liaw, P. K.; Buchanan, R. A. // Applied Physics Letters;3/27/2006, Vol. 88 Issue 13, p131902 

    In this letter, we report the fatigue-property enhancement by a thin layer of glass-forming film. The fatigue life of a 316L stainless steel is considerably improved by at least 30 times, depending on the maximum applied stress when it is coated with a 200 nm thick Zr47Cu31Al13Ni9 film. The...

  • Influence of Xe ion-bombardment on the substrate microstructure and the residual stresses of TiN coatings deposited by plasma reactive sputtering onto AISI 4140 steel. Miranda, Thais Helena Carvalho; Vales, Sandra; Becerra, Erika Ochoa; Junior, Roosevelt Droppa; Brito, Pedro Paiva; Garcia, Jose Luis; Alvarez, Fernando; Pinto, Haroldo // Advanced Materials Research;2014, Vol. 996, p841 

    The seek for sustainability in the global economic scenario has led to the need for developing materials that provide higher productivity, greater speed of operation, extended lifetimes and enhanced surface finishing of engineering parts. To achieve these goals it is essential to modify the...

  • Microstructure, stress and texture in sputter deposited TiN thin films: effect of substrate bias. Chakraborty, J.; Maity, Tias; Kumar, Kishor; Mukherjee, S. // Advanced Materials Research;2014, Vol. 996, p855 

    Titanium nitride thin films deposited by reactive dc magnetron sputtering under various substrate bias voltages have been investigated by X-ray diffraction. TiN thin films exhibits lattice parameter anisotropy for all bias voltages. Preferential entrapment of argon atoms in TiN lattice has been...

  • Off-axis electron holography of pseudo-spin-valve thin-film magnetic elements. Kasama, T.; Barpanda, P.; Dunin-Borkowski, R. E.; Newcomb, S. B.; McCartney, M. R.; Castaño, F. J.; Ross, C. A. // Journal of Applied Physics;7/1/2005, Vol. 98 Issue 1, p013903 

    Magnetic remanent states in a rectangular array of 75×280-nm2 NiFe/Cu/Co thin-film pseudo-spin-valve elements are studied using off-axis electron holography in the transmission electron microscope (TEM). An approach based on focused ion-beam milling is used to minimize damage to the magnetic...


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics