TITLE

Low pressure photodeposition of silicon nitride films using a xenon excimer lamp

AUTHOR(S)
Bergonzo, P.; Boyd, Ian W.
PUB. DATE
September 1993
SOURCE
Applied Physics Letters;9/27/1993, Vol. 63 Issue 13, p1757
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the low pressure photodeposition of silicon nitride films using a xenon excimer. Importance of dielectric thin film deposition in a processing step in semiconductor; Presentation of photolytic chemical vapor deposition; Use of substrate in the orientation crystalline silicon.
ACCESSION #
4294068

 

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