Fabrication of high aspect ratio silicon pillars of <10 nm diameter

Wei Chan; Ahmed, Haroon
August 1993
Applied Physics Letters;8/23/1993, Vol. 63 Issue 8, p1116
Academic Journal
Examines the fabrication of high aspect ratio of sub-10 nanometer size in silicon without involving any wet chemical etching. Electron beam exposure of low and high molecular weight polymethylmethacrylate resist; Thick film deposition by ionized beam evaporation and metal pattern obtained by liftoff; Use of scanning electron microscope to record quantum dots.


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