Electron cyclotron resonance plasma process for InP passivation

Hu, Y.Z.; Li, M.; Wang, Y.; Irene, E.A.; Rowe, M.; Casey Jr., H.C.
August 1993
Applied Physics Letters;8/23/1993, Vol. 63 Issue 8, p1113
Academic Journal
Examines the electron cyclotron resonance (ECR) plasma process for indium phosphide (InP) passivation using in situ ellipsometry. Monitoring of ECR at room temperature in the shadow between a shutter and the sample; Implication for the absence of detectable excess phosphorus at the InP-oxide interface; Techniques used in analyzing the dielectric layers.


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