Electrical properties of strontium titanate thin films by multi-ion-beam reactive sputtering

Peng, C.-J.; Hu, H.; Krupanidhi, S.B.
August 1993
Applied Physics Letters;8/23/1993, Vol. 63 Issue 8, p1038
Academic Journal
Describes the electrical properties of strontium titanate thin films by multi-ion-beam reactive sputtering technique. Dependence of the dielectric behavior on the thickness of the films; Influence of the interface layers between the film and silicon substrate on the electrical behavior; Effect of the Poole-Frenkel emission mechanisms on film conduction.


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