Stabilization of C-49 Ti(Al[sub x]Si[sub 1-x])[sub 2] observed from the reaction between

Chung, I.; Nam, H.G.; Bene', R.W.
October 1992
Applied Physics Letters;10/26/1992, Vol. 61 Issue 17, p2033
Academic Journal
Examines the solid state reaction between aluminum and titanium silicide over a temperature range of 400 to 800 degree Celsius. Similarity of the observed phase structure type and lattice parameters; Substitution of silicon with aluminum during 800 degree Celsius annealing; Identification of bulk sample phases from x-ray diffraction.


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