Liquid precursor two-step aluminum thin-film deposition on KrF-laser patterned palladium

Lehmann, O.; Stuke, M.
October 1992
Applied Physics Letters;10/26/1992, Vol. 61 Issue 17, p2027
Academic Journal
Examines the deposition of high quality aluminum films using a two-step process. Application of triethylamine alane as precursor in a aluminum covered palladium catalyst; Provision of precursor in the liquid phase; Use of the technique under atmospheric pressure condition in an inert gas atmosphere; Generation of one micrometer thick aluminum metal films.


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