TITLE

Liquid precursor two-step aluminum thin-film deposition on KrF-laser patterned palladium

AUTHOR(S)
Lehmann, O.; Stuke, M.
PUB. DATE
October 1992
SOURCE
Applied Physics Letters;10/26/1992, Vol. 61 Issue 17, p2027
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the deposition of high quality aluminum films using a two-step process. Application of triethylamine alane as precursor in a aluminum covered palladium catalyst; Provision of precursor in the liquid phase; Use of the technique under atmospheric pressure condition in an inert gas atmosphere; Generation of one micrometer thick aluminum metal films.
ACCESSION #
4293970

 

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