TITLE

High-fluidity chemical vapor deposition of silicon dioxide

AUTHOR(S)
Shin, H.; Miyazaki, S.; Hirose, M.
PUB. DATE
May 1992
SOURCE
Applied Physics Letters;5/25/1992, Vol. 60 Issue 21, p2616
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the possibility that the deposition precursors of silicon dioxide could be silanos and siloxanes. Suppression of the thermal reaction on the surface; Reduction of the ion flux onto the growth surface; Planarization of the topography; Formation of the liquefied-precursor on the cooled surface.
ACCESSION #
4293929

 

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