Electron cyclotron resonance plasma deposition of silicon nitride: Effect of very low rf

Buckle, K.A.; Rodgers, J.; Pastor, K.; Constantine, C.; Johnson, D.
May 1992
Applied Physics Letters;5/25/1992, Vol. 60 Issue 21, p2601
Academic Journal
Investigates the plasma deposition of silicon nitride on silicon substrates in a microwave electron cyclotron resonance. Examination of the low levels of radio frequency bias; Measurement of the effect of bias for the deposited films; Effect of the applied radio frequency bias on film density.


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