Deposition of TiN using tetrakis(dimethylamido)-titanium in an electron-cyclotron-resonance

July 1993
Applied Physics Letters;7/19/1993, Vol. 63 Issue 3, p325
Academic Journal
Examines the deposition of titanium nitride (TiN) layers in an electron-cyclotron-resonance plasma process. Use of tetrakis(dimethylamido)-titanium as precursor; Properties of the gold-colored TiN layers; Characterization of the deposits by resistivity measurements.


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