Mass-resolved ion energy measurements at the grounded electrode af an argon rf plasma

July 1993
Applied Physics Letters;7/19/1993, Vol. 63 Issue 3, p308
Academic Journal
Determines the mass-resolved ion energy distribution at the grounded electrode of an argon radio-frequency (rf) plasma. Use of rf plasmas on semiconductor industry for dry etching and deposition; Confinement of the rf plasma in a microwave cavity; Measurement of the electron and negative ion densities by microwave techniques.


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